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Characteristics of SiO2 Etching by using Pulse-Time Modulation in 60 MHz/2 MHz Dual-Frequency Capaci
[会议论文] 作者：S.-K Kang,J. Y. Park,G. Y. Yeom,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity,but also low electron temperature....
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