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Real-Time Dose Monitoring System by Sensing Implanter Current and Biased Pulse Voltage in Plasma Sou
[会议论文] 作者:Se-Jin Oh,Yu-Sin Kim,Jae-Won Lee,Chin-Wook Chung,
来源:2011年第三届微电子及等离子体技术国际会议 年份:2011
To measure ion dose in plasma source ion implantation (PSII) is very important for monitoring processing reliability and repeatability....
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