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[会议论文] 作者：Saiqian Zhang,Zhongling Dai,Younian Wang,
来源：The 17th International Conference on Surface Modification of 年份：2011
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[会议论文] 作者：Saiqian Zhang,Zhongling Dai,Younian Wang,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
Atomic layer etching (ALE) is gaining prospects in industry application,as the precision demands for smaller feature patterning is more urgent.The ALE process uses cyclic passivation and etching steps...
Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias wa
[期刊论文] 作者：Xiaoqin MA,Saiqian ZHANG,Zhongling DAI,Younian WANG,
来源：黑龙江科技信息 年份：2017
本文通过对荣华二采区10...
[会议论文] 作者：XiFeng Wang,Yuanhong Song,Zhongling Dai,Younian Wang,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
Pulsed electronegative plasmas have a wide application due to their flexibility in adjusting the duty ratio and pulse frequency.In these discharges,density and flux of different species can be tailore...
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