• 不 限
  • 期刊论文
  • 硕博论文
  • 会议论文
  • 报 纸
  • 英文论文
  2. 您的位置
  3. 首页
  4. 会议论文
  5. Spatio-temporal evolution of electron and Ion kinetics in pulsed SiH4/Ar discharge

Spatio-temporal evolution of electron and Ion kinetics in pulsed SiH4/Ar discharge

来源 :13th Asia-Pacific Conference on Plasma Science and Technolog | 被引量 : 0次 | 上传用户：pettey
【摘 要】
：
Pulsed electronegative plasmas have a wide application due to their flexibility in adjusting the duty ratio and pulse frequency.In these discharges,density and flux of different species can be tailore
【作 者】
：
XiFeng Wang Yuanhong Song Zhongling Dai Younian Wang 
【机 构】
：
School of Physics and Optoelectronic Technology, Dalian University of Technology,Dalian, China
【出 处】
：
13th Asia-Pacific Conference on Plasma Science and Technolog
【发表日期】
：
2016年10期
【关键词】
：
hybrid model CCP pulse modulated SiH4/Ar 
下载到本地 , 更方便阅读
下载此文 赞助VIP
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
　　Pulsed electronegative plasmas have a wide application due to their flexibility in adjusting the duty ratio and pulse frequency.In these discharges,density and flux of different species can be tailored by pulse modulation,and thus offers tunability for obtaining ideal plasmas.In the afterglow,the existing species can diffuse to electrodes in some complicated physical and chemical procedures indistinctly,which also can be beneficial to the processing wafer.
其他文献
The diagnostic of ICP assisted HiPIMS plasma by OES
In this work,we report the parameters in novel plasma source diagnosed by optical emission spectrometry (OES) during a high c-axis orientation ZnO film deposition.The high power impulse magnetron sput
会议
inductively coupled plasmaHiPIMSOESdiagnostic
Atomic layer etching of SiO2 in fluorocarbon plasmas with tailored voltage waveforms
Atomic layer etching (ALE) is gaining prospects in industry application,as the precision demands for smaller feature patterning is more urgent.The ALE process uses cyclic passivation and etching steps
会议
Atomic layer etchingtailored voltage waveformsheathion energy and angular dis
Modeling study on nitrogen vibrational kinetics in a single nanosecond pulse high voltage air discha
We report a simulation study on single nanosecond pulse high voltage discharge in dry-air at a pressure of 100 Torr.Apart from the usual processes such as vibrational-vibrational exchange and vibratio
会议
nanosecond pulsed dischargeplasma simulationvibrational kinetics
Nurnerical characterization of inductively coupled plasmas at low pressure in argon
As widely used in the substrate etching,thin film growth,plasma propulsion,materials processing and semiconductor industry,inductively coupled plasma source (ICPs) excited by a single radio frequency
会议
inductively coupled plasmanumerical simulationAr discharges
Effects of RF bias power on plasma uniformity in a large-area inductively coupled plasma based on fl
Plasma large-area etching technology requires inductively coupled plasma (ICP) reactors to work with a uniform plasma density.A two-dimensional (2D) self-consistent fluid model has been employed to in
会议
Inductively coupled plasmaRF bias voltageplasma uniformity
Characteristics of vacuum arc Ion source with Ti cathode
会议
Study on diagnosis of pulsed laser induced photo-detachment technique for capacitively coupled negat
Probe-assisted pulsed laser induced photo-detachment (LIPD) technique was usually used for diagnose negative ion denstiy,electronegativity and even negative ion temperature in the electronegative plas
会议
laser induced photodetachmentelectronegative plasmaplasma spatial potentialel
Experimental and numerical investigations of Ar inductively coupled plasma for a remote plasma
An inductively coupled plasma (ICP) system in which a remote ICP (expansion region) with large volume is attached to a main ICP (driver region) is developed.The axially and radially resolved measureme
会议
Inductively coupled plasmaLangmuir probefluid model
Effect of segmented electrode length on the performances of Hall thruster
The influences of the Iow-emissive graphite segmented electrode placed near the channel exit on the discharge characteristics of Hall thruster are studied using the particle-in-cell method.A two-dimen
会议
Hall ThrusterSegmented electrodesParticle-in-cellIonization rate
Electronic transport behavior in inductively coupled hydrogen discharge
Inductively coupled hydrogen plasmas are widely utilized in a broad range of technology areas including fusion,negative ion sources,positive ion sources,neutral beam injectors (NBI),plasma etching,and
会议
Inductively coupled hydrogen dischargeexpansion regionLangmuir probe