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Information on the chemical composition,physical properties and thethree-dimensional structure of materials and devices is of major importance.TOF-SIMS is known to be an extremely sensitive surface imaging technique whichprovides elemental as well as comprehensive molecular information on all types ofsolid surfaces.In the so-called dual beam mode the pulsed analysis beam is combinedwith a low energy sputter ion beam for the removal of material.This allows depthprofiling of multilayers with high depth resolution as well as three-dimensionalanalysis.