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5. Effect of N2 addition on atmospheric-pressure plasma CVD of TiO2 photocatalytic films

Effect of N2 addition on atmospheric-pressure plasma CVD of TiO2 photocatalytic films

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：xiaoc009

【摘 要】

：

Dielectric barrier discharge (DBD) was widely used for generating atmospheric pressure,non-thermal plasmas and recently explored for preparing TiO2 films.

【作 者】

：

Lan-Bo Di Xiao-Song Li Ai-Min Zhu 

【机 构】

：

Laboratory of Plasma Physics Chemistry, School of Physics and Optoelectronic Engineering & School of

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Atmospheric-pressure plasma DBD Plasma CVD TiO2 photocatalytic films 

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Dielectric barrier discharge (DBD) was widely used for generating atmospheric pressure,non-thermal plasmas and recently explored for preparing TiO2 films.

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