The influences of processing parameters on properties of Alumina films deposited by ECR plasma-assis

来源 :第一届国际ALD应用大会暨第二届中国ALD学术交流会 | 被引量 : 0次 | 上传用户：sz_yaoli

【摘要】

：

【作者】

：

Lijun Sang Qiang Chen Lizhen Yang Zhengduo Wang Zhongwei Liu

【机构】

：

Laboratory of Plasma Physics and Materials,Beijing Institute of Graphic Communication,Beijing,China

【出处】

：

第一届国际ALD应用大会暨第二届中国ALD学术交流会

【发表日期】

：

2012年4期

【关键词】

：

plasma-assisted alumina atomic layer deposition

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　　Without extra-heating,Al2O3 films were prepared by atomic layer deposition(ALD)process through a home-made ECR setup.The influences of processing parameters on properties of alumina films were investigated through X-ray photoelectric spectroscopy(XPS),scanning electron microscopy(SEM),atomic force microscopy(AFM).

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