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5. Modeling of an Inductively Coupled Cl2/Ar Plasma Using Neural Network

Modeling of an Inductively Coupled Cl2/Ar Plasma Using Neural Network

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：jgw0646

【摘 要】

：

Plasma process has gained widespread use in the manufacture of micro- and nano- electronics technology since it can increase the integrated density of devices.

【作 者】

：

Moonkeun Kim Hanbyeol Jang Yong-Hwa Lee Kwang-Ho Kwon 

【机 构】

：

Dept. of Control and Instrumentation Engineering, Korea University, Jochiwon, Chungnam, 339-700,Repu

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Neural Network Cl2/Ar Inductively Coupled Plasma Double Langmuir Probe 

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Plasma process has gained widespread use in the manufacture of micro- and nano- electronics technology since it can increase the integrated density of devices.

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