Modeling of an Inductively Coupled Cl2/Ar Plasma Using Neural Network

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户:jgw0646
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Plasma process has gained widespread use in the manufacture of micro- and nano- electronics technology since it can increase the integrated density of devices.
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