Advanced Mitigation Process for Improving Laser Damage Threshold of Fused Silica Optics

来源 :LIMIS 2016——The 4th International Symposium on Laser Interac | 被引量 : 0次 | 上传用户：dannychan

【摘要】

：

The laser damage precursors in subsurface of fused silica (e.g.photosensitive impurities,scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-f

【作者】

：

Xin Ye

【机构】

：

Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, P.R.China

【出处】

：

LIMIS 2016——The 4th International Symposium on Laser Interac

【发表日期】

：

2016年8期

【关键词】

：

Laser induce damage threshold HF etching Fused silica

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Advanced Mitigation Process for Improving Laser Damage Threshold of Fused Silica Optics

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