Microwave thermal annealing of block copolymer thin films

来源 :The 6th International Conference on Nanoscience and Technolo | 被引量 : 0次 | 上传用户:yluylu2k
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  Conventional photolithography is rapidly approaching its inherent resolution limits [1].To further drive Moore's Law in an economically viable manner,alternative lithography technologies are needed to meet cost,resolution(sub-20 nm),and throughput requirements(120 wafers/hour),as defined by the International Technology Roadmap for Semiconductors(ITRS)[2].
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