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采用Ti/B4C复合靶作为靶材,通过磁控溅射方法沉积了成分、结构可调的Ti-B-C薄膜。利用X射线光电子能谱(XPS)和X射线衍射(XRD)分析了Ti-B-C薄膜的成分和结构,利用纳米压痕法测量了Ti-B-C薄膜的力学性能。结果表明,励磁线圈电流改变会影响薄膜的成分和结构,沉积温度改变对薄膜的成分无明显影响,但会影响薄膜结构,溅射电压改变对薄膜的成分和结构均无明显影响。薄膜的力学性能是薄膜中内应力和晶态硬质相含量综合作用的结果。通过调整沉积参数以及热处理条件,可以获得性能优异的Ti-B-C薄膜。
Using Ti / B4C composite target as the target, Ti-B-C films with adjustable composition and structure were deposited by magnetron sputtering. The composition and structure of Ti-B-C thin films were analyzed by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The mechanical properties of Ti-B-C films were measured by nanoindentation. The results show that the change of the current in the exciting coil affects the composition and structure of the film. The change of deposition temperature has no significant effect on the composition of the film but affects the structure of the film. The change of sputtering voltage has no significant effect on the composition and structure of the film. The mechanical properties of the film are the result of a combined effect of internal stress and crystalline hard phase content in the film. By adjusting the deposition parameters and heat treatment conditions, Ti-B-C films with excellent properties can be obtained.