Low Plasma Induced Damaged Neutral Beam Etching of Metal Gate in Metal Gate/High-k Dielectric CMOSFE

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户:babyjl1219
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As the critical dimension (CD) of the metal-oxide-semiconductor field effect transistor (MOSFET) is scaled down to 45nm node and below,the compatibility of the present gate (poly-Si) with high-k dielectric is intrinsically limited.Therefore,a metal gate,as an alternative to poly-Si has been considered.
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