【摘 要】
：
Chemical vapor deposition (CVD) method is used to grow large scale, high quality and single-layer graphene on platinum.Some key parameters, including deposition temperature, cooling rate, deposition t
【机 构】
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Institute of Microelectronics,Tsinghua University,Beijing 100084,China
【出 处】
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International Conference on Nanoscience & Technology,China 2
论文部分内容阅读
Chemical vapor deposition (CVD) method is used to grow large scale, high quality and single-layer graphene on platinum.Some key parameters, including deposition temperature, cooling rate, deposition time, chamber pressure and platinum quality, were examined by a series of experiments.Various characterization techniques (OM, SEM, AFM, Raman, etc.) were applied to evaluate the graphene morphology and quality.It is found that a higher temperature lead to a better coverage but more multi-layers.
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