Hydrogenated amorphous carbon (a-C:H) films were deposited on Ti-6Al-4V and silicon substrates with various substrate pulse negative bias voltage by magnetron sputtering method in two precursor gas mixture, argon and methane. The effect of bias voltage on microstructure, mechanical and tribological properties was investigated. As the bias voltage increases from -400 to -1200 V, the sp2 content in a-C:H films increases, indicating the graphitization of the films, the hardness and internal stress gradually decrease. However, the adhesion strength increases at a certain bias voltage and then reduces with the bias voltage continuing to increase. Therefore, the a-C:H films with relatively high hardness, low internal stress and good adhesion strength can be obtained by changing the value of substrate negative bias voltage. Particularly, the film prepared at -800 V applied bias voltage at expense of some hardness performs a low friction (~0.05) behavior and long wear life in ambient environment, where the relative humidity and room temperature are ~30% and ~25 oC, respectively. The correlation between wear life and mechanical, tribological properties of the a-C:H films was presented.