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本文介绍了一种离子束辅助薄膜沉积的新工艺,它可以大大降低膜的接触电阻、提高膜的附着力,提高膜的质量,消除膜的应力。
In this paper, a new technique of ion beam assisted deposition of thin films is introduced, which can greatly reduce the contact resistance of the film, improve the adhesion of the film, improve the quality of the film and eliminate the stress of the film.