据英国 New Scientist 1993年2月13日报道,根据美国电报电话公司贝尔实验室发展的一种技术,可以更为廉价且方便地制成最先进的硅集成电路片。采用照相制版术可在基片上淀积金属和绝缘膜制成电路.将光致抗蚀剂涂于经部分加工的硅晶片上 According to the British New Scientist reported on February 13, 1993, according to a technology developed by AT & T Bell Labs, state-of-the-art silicon integrated circuit chips can be made cheaper and more conveniently. Using photolithography, a circuit can be made by depositing a metal and an insulating film on a substrate. A photoresist is applied to the partially processed silicon wafer