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碲镉汞(HgCdTe)红外探测器制备中的化学-机械抛光工艺会在碲镉汞材料表面形成一定深度的损伤层。用溴-甲醇化学机械抛光取代溴腐蚀工艺,有效地降低了抛光过程所产生的表面损伤。在溴-甲醇抛光工艺中,可变参数有溶液的浓度比、抛光时间、转盘转速等,不同的参数组合对于抛光效果有不同的影响,经过正交试验可以以较少的试验次数高效经济地得到最佳的溴-甲醇抛光工艺参数组合。以该优化参数进行抛光所得到的碲镉汞材料通过XRD测试以及Ar+刻蚀后表面形貌的测试表明,HgCdTe晶片表面剩余损伤大大减小。
The chemical-mechanical polishing process in the preparation of HgCdTe infrared detectors forms a certain depth of damage layer on the surface of the HgCdTe material. Bromo - methanol chemical mechanical polishing to replace the bromine corrosion process, effectively reducing the surface damage caused by the polishing process. In the bromine-methanol polishing process, the variable parameters such as the concentration ratio of the solution, the polishing time, the rotating speed of the rotating disk, and the different parameters have different influences on the polishing effect. After orthogonal experiments, the number of experiments can be reduced efficiently and economically Get the best bromine - methanol polishing process parameters combination. The HgCdTe wafer surface residual damage was greatly reduced by the XRD test and the surface morphology of the HgCdTe wafer after polishing with the optimized parameters.