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本文研究了在25%的四甲基氢氧化铵水溶液(TMAHW)中加入异丙醇(IPA)构成的腐蚀系统对硅的各向异性腐蚀特性.研究发现:在异丙醇含量从0%到80%体积比的广大范围内,溶液对硅均有显著的腐蚀作用,且表面质量比纯TMAHW的更好.实验给出了腐蚀速率、削角比和各向异性比R_(100)/R_(111)等参数与IPA含量的关系,结果表明:50%体积IPA与50%体积TMAHW构成的溶液存在腐蚀速率的极大值、削角的极小值和最大的各向异性比及R_(100)/R_(111).因之按此比例配制的新腐蚀液具有表面质量好,与MOS工艺相容以及低成本的优点.
In this paper, we investigated the anisotropic corrosion behavior of silicon in 25% tetramethylammonium hydroxide aqueous solution (TMAHW) by adding isopropanol (IPA) .It is found that when the isopropanol content is from 0% to The results show that the solution has remarkable corrosion effect on silicon and the surface quality is better than that of pure TMAHW in a wide range of 80% by volume.The corrosion rate, chamfer ratio and anisotropy ratio R_ (100) / R_ (111) and IPA content. The results show that the maximum corrosion rate, the minimum value and the maximum anisotropy ratio of the solution and the solution of 50% volume IPA and 50% 100) / R 111. The new etching solution formulated in this ratio has the advantages of good surface quality, compatibility with MOS technology and low cost.