针对现有微透镜加工方法难以在红外探测器衬底材料CdZnTe上实现大孔径、深浮雕微透镜制备,提出了一种利用ICP-RIE干法刻蚀结合化学湿法腐蚀制备折射微透镜的方法,通过采用多次光刻套刻后分别对CdZnTe材料进行高刻蚀速率、低损伤的ICP-RIE刻蚀,制备出具有深浮雕结构的微透镜雏形,最后采用溴-乙醇溶液腐蚀成形,成功在CdZnTe衬底上制备了深度达60μm的连续深浮雕结构的微透镜线列,并对该微透镜的面形轮廓和光学性能进行了测试分析,在红外探测器的微光学元件领域有着巨大的应用前景。 Aiming at the problem that it is difficult to fabricate large aperture and deep relief microlens on the surface of CdZnTe infrared detector, the method of dry etching of ICP-RIE combined with chemical wet etching is proposed. , The micro-lens prototype with deep relief structure was prepared by using high lithography rate and low-damage ICP-RIE etching of CdZnTe material after multiple photolithography and photolithography, and finally the etching was completed by using bromine-ethanol solution. A series of microlens arrays with a depth of up to 60μm were fabricated on a CdZnTe substrate. The surface profile and optical properties of the microlenses were tested and analyzed. In the field of micro-optics of infrared detectors, Application prospects.