论文部分内容阅读
以WC -6%Co为基体 ,采用磁控溅射法 ,在原始试样、酸腐蚀试样以及酸蚀后进行氢等离子体脱碳处理的试样上制备Ti过渡层 ,然后碳化过渡层为TiC。在热丝化学气相沉积装置中 ,制备金刚石薄膜。研究三种不同试样上的金刚石薄膜与基体的附着力。结果表明 ,在原始试样上的金刚石薄膜在冷却过程中自动脱落 ;在经等离子体处理后的试样上 ,金刚石薄膜与基体间附着力高于在经酸蚀处理的试样上的金刚石薄膜与基体附着力。造成这种现象的主要原因可能是等离子体脱碳还原处理降低WC晶粒表面能 ,增强Ti与WC间的结合强度 ,导致TiC过渡层与WC基体结合强度增加 ,从而增加金刚石薄膜附着力。
Taking Ti-6% Co as the matrix, a Ti transition layer was prepared on the original sample, the acid corrosion sample and the sample subjected to hydrogen plasma decarburization after acid etching by magnetron sputtering method, and then the carbonation transition layer was TiC. In the hot filament chemical vapor deposition apparatus, a diamond thin film was prepared. The adhesion of the diamond film to the substrate on three different samples was studied. The results show that the diamond film on the original sample automatically falls off during the cooling process. On the plasma-treated sample, the adhesion between the diamond film and the substrate is higher than that on the diamond-etched sample With the substrate adhesion. The main reason for this phenomenon may be that the plasma decarburization reduction reduces the surface energy of the WC grains and increases the bonding strength between Ti and WC, resulting in the increase of bonding strength between the TiC transition layer and the WC matrix, thereby increasing the diamond film adhesion.