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实现薄膜光学参数的简便测量对于薄膜的制备和应用具有重要意义。引入适用于半导体材料的Forouhi_Bloomer模型,用其表征薄膜折射率与色散的关系。考虑到粗糙度的影响,假设薄膜厚度服从正态分布,给出了模拟退火法与迭代法相结合、由可见光光谱测定薄膜光学参数的方法。作为尝试,以硅系薄膜为例进行了计算。结果表明,获得的厚度与用椭偏仪测量的结果较为吻合。该方法适用于研究和测量半导体薄膜的光学性能和膜厚,具有很高的实用价值。
The simple measurement of the optical parameters of the film is of great significance for the preparation and application of the film. Forouhi_Bloomer model is introduced for semiconductor materials, which is used to characterize the relationship between refractive index and chromatic dispersion. Considering the effect of roughness, assuming the film thickness obeys normal distribution, a method combining simulated annealing method and iterative method is proposed to measure the optical parameters of thin film by visible light spectroscopy. As an attempt, a silicon-based thin film was taken as an example. The results show that the obtained thickness is in good agreement with the results measured by the ellipsometer. The method is suitable for studying and measuring the optical properties and the film thickness of a semiconductor film, and has high practical value.