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采用微波等离子体化学气相沉积法（ＭＰＣＶＤ），用高纯氮气（９９．９９９％ ）和甲烷（９９．９％ ）作反应气体，在多晶铂（Ｐｔ）基片上沉积Ｃ３Ｎ４ 薄膜。利用扫描电子显微镜（ＳＥＭ）和扫描隧道显微镜（ＳＴＭ）观察薄膜形貌表明，薄膜由针状晶体组成。Ｘ射线能谱（ＥＤＸ）分析了这种晶态Ｃ－Ｎ膜的化学成分。对不同样品不同区域的分析结果表明，Ｎ／Ｃ比接近于４／３。Ｘ射线衍射结构分析说明该膜主要由β－Ｃ３Ｎ４ 和α－Ｃ３Ｎ４ 组成。利用Ｎａｎｏ ｉｎｄｅｎｔｅｒ Ⅱ测得Ｃ３Ｎ４ 膜的体弹性模量Ｂ达到３４９ ＧＰａ，接近ｃ－ＢＮ（３６７ ＧＰａ）的体弹性模量，证明Ｃ３Ｎ４ 化合物是超硬材料家族中的一员。
A C3N4 thin film was deposited on a polycrystalline platinum (Pt) substrate by microwave plasma chemical vapor deposition (MPCVD) with high purity nitrogen (99.999%) and methane (99.9%) as reaction gases. Scanning electron microscopy (SEM) and scanning tunneling microscope (STM) to observe the film morphology showed that the film consists of acicular crystals. The chemical composition of this crystalline C-N film was analyzed by X-ray spectroscopy (EDX). Analysis of different regions of different samples showed that the N / C ratio was close to 4/3. X-ray diffraction structure analysis shows that the membrane mainly consists of β-C3N4 and α-C3N4. The bulk elastic modulus B of the C3N4 membrane measured by Nano indenter II reached 349 GPa, close to the bulk modulus of c-BN (367 GPa), demonstrating that the C3N4 compound is a member of the superhard material family.