The electron energy distribution functions (EEDFs) are studied in the planar-type surface-wave plasma (SWP)caused by resonant excitation of surface plasmon polaritons (SPPs) using a single cylindrical probe.Sustained plasma characteristics can be considered as a bi-Maxwellian EEDF,which correspond to a superposition of the bulk low-temperature electron and the high-energy electron beam-like part.The beam component energy is pronounced at about 10eV but the bulk part is lower than 3.5eV.The hot electrons included in the proposed plasmas play a significant role in plasma heating and further affect the discharge chemistry.During the past several years,in the fabrication ofamorphous or crystalline silicon films,diamond film synthesis and carbon nanotube growth,the large-area overdense plasma source has been useful.In electronic device fabrication techniques such as etching,ashing or plasma chemical vapor deposition,overdense electrons and radicals are required,especially hot electrons.Among the various plasma devices,the planar-type surface-wave plasma (SWP) source is an advanced plasma source,which is a type of promising plasma source satisfying the above rigorous requirements for large-area plasma processing.