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利用低能中性团簇束流淀积（ＬＥＣＢＤ）方法制备硅团簇薄膜，观察到Ｓｉ团簇特殊的分形生长现象，并对此非平衡动力学过程作初步的探讨。
Silicon thin films were prepared by low energy neutral cluster beam deposition (LECBD) method. The special fractal growth phenomenon of Si clusters was observed and the non-equilibrium kinetic process was discussed preliminarily.