论文部分内容阅读
为了制作平面变线密度光栅,满足线密度变化的要求,采用两个点光源和辅助透镜对基底曝光。编写了第一代和第二代光路的计算程序,计算出拍摄光路的几何位置参量,依据实际情况选择光路。提出了在线检测波前的方法,将辅助的标准光栅放在基底的位置上,入射光被标准光栅衍射,衍射光在光栅表面的干涉条纹反映了入射光的波前分布。采用数码相机和辅助镜拍摄干涉条纹,编写条纹分析程序,根据条纹调节元件的位置,直到入射波前满足要求后,对涂有光刻胶的基底曝光,制作出了原型的变线密度光栅。波前检测方法也可以用于其他全息光栅的制作中。
In order to make a plane variable line density grating to meet the requirements of linear density changes, two point light sources and auxiliary lenses are used to expose the substrate. Prepared the first generation and second generation of optical computing procedures to calculate the geometry of the shooting light path parameters, according to the actual situation to choose the optical path. A method of on-line detecting wavefront is proposed. The auxiliary standard grating is placed on the substrate. The incident light is diffracted by a standard grating. The interference fringes of the diffracted light on the grating surface reflect the wavefront distribution of the incident light. A digital camera and auxiliary lens were used to photograph the interference fringes. The fringe analysis program was programmed. According to the position of the fringe adjustment components, the exposed variable grating was fabricated by exposing the photoresist-coated substrate to the incident wavefront. Wavefront detection methods can also be used in the fabrication of other holographic gratings.