与现有的金刚石膜抛光工艺相匹配的高效刻蚀技术，是目前研究的热点。自行研制的稀土 化合物浆料对 CVD金刚石厚膜进行了刻蚀研究，刻蚀过程在低于金刚石氧化点的温度下和大气 环境中完成。其刻蚀结果，用扫描电子显微镜给出。实验表明 ,该工艺采用廉价的稀土化合物为 原料，具有简单、安全、高效的特点。 With the existing diamond film polishing process to match the efficient etching technology, is the current research hot spots. The rare earth compound slurry developed by ourselves has been used to study the CVD diamond thick film. The etching process is completed at the temperature lower than the oxidation point of diamond and in the atmosphere. The result of the etching is given by a scanning electron microscope. Experiments show that the process uses cheap rare earth compounds as raw materials, with simple, safe and efficient features.