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近代分析化学的基本任务之一就是测定高纯材料中的微量杂质。与这类分析对象有关的,首先是半导体材料和很多稀有金属。由于需要测定的杂质数量往往很多,又要求分析的灵敏度达到10~(-6)～10~(-8)%,能够同时测定很多元素采用的主要方式是预先将杂质转移到组富集物中去。与微量杂质富集有关的一般问题和某些专题在高纯材料分析手册、会议录和评论性文章中可以查到。表1中列出了最近二十年,也就是从这类工作发表开始的关于稀有金属和半导体材料分
One of the basic tasks of modern analytical chemistry is the determination of trace impurities in high purity materials. Related to this type of analysis, the first is the semiconductor materials and many rare metals. Since the amount of impurities to be measured is often large and the sensitivity of the analysis is required to reach 10 -6 to 10 -8%, the main way to be able to simultaneously determine many elements is to pre-transfer the impurities to the group enrichment go with. General problems and certain topics related to the enrichment of trace impurities can be found in high purity materials analysis brochures, proceedings and commentary articles. Table 1 lists the last two decades, that is, from the beginning of such work on rare metals and semiconductor materials points