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A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 μm complementary metal-oxide-semiconductor technology.This device is capable of versatile working modes:it can emit visible to near infra-red (NIR) light (the spectrum ranges from 500 nm to 1000 nm) in reverse bias avalanche breakdown mode with working voltage between 8.35 V-12 V and emit NIR light (the spectrum ranges from 900 nm to 1300 nm) in the forward injection mode with working voltage below 2 V.An apparent modulation effect on the light intensity from the polysilicon gate is observed in the forward injection mode.Furthermore,when the gate oxide is broken down,NIR light is emitted from the polysilicon/oxide/silicon structure.Optoelectronic characteristics of the device working in different modes are measured and compared.The mechanisms behind these different emissions are explored.
A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 μm complementary metal-oxide-semiconductor technology. This device is capable of versatile working modes: it can emit visible to near infra-red (NIR) light (the spectrum range from 500 nm to 1000 nm) in reverse bias avalanche breakdown mode with working voltage between 8.35 V-12 V and emit NIR light (the spectrum ranges from 900 nm to 1300 nm) in the forward injection mode with working voltage below 2 V .An apparent modulation effect on the light intensity from the polysilicon gate is observed in the forward injection mode. Fuerthermore, when the gate oxide is broken down, NIR light is emitted from the polysilicon / oxide / silicon structure. Optoelectronics characteristics of the device working in different modes are measured and compared. The mechanisms behind these different emissions are explored.