利用扫描电子显微镜、原子力显微镜等手段研究负偏压对多弧离子镀制备的(Ti,Cr)N薄膜表面缺陷、表面粗糙度、化学成分、沉积速率及硬度的影响。结果发现:随着负偏压的增加,(Ti,Cr)N薄膜的液滴受到抑制,表面粗糙度下降,沉积速率降低,硬度增加,但负偏压对薄膜的Cr含量影响较小。 The effects of negative bias on the surface defects, surface roughness, chemical composition, deposition rate and hardness of (Ti, Cr) N thin films prepared by multi-arc ion plating were investigated by scanning electron microscope and atomic force microscope. The results show that with the increase of negative bias, the droplets of (Ti, Cr) N thin film are inhibited, the surface roughness is decreased, the deposition rate is decreased and the hardness is increased, but the negative bias has little effect on the Cr content of the film.