论文部分内容阅读
利用脉冲电沉积法制备了掺钴氧化钨电致变色薄膜，并探讨了该方法的机理。利用后续退火处理使之结晶。测定了掺钴和不掺钴ＷＯ_３薄膜的结构特性、电化学特性及透射光谱，并研究了金属钻的掺杂对这些特性的影响。
The electrochromic tungsten oxide doped electrochromic thin films were prepared by pulse electrodeposition method and the mechanism of the method was discussed. The subsequent annealing treatment to make it crystallized. The structural, electrochemical and transmission spectra of the WO_3 films doped with or without cobalt have been measured. The effects of metal diamond doping on these properties have also been investigated.