主要研究了湿法化学刻蚀硅微尖．采用各向同性腐蚀的方法在〈１１１〉晶面和〈１００〉晶面的单晶硅衬底上制备了硅微尖．实验结果表明〈１１１〉晶面的硅衬底上容易制备顶端曲率半径比较小的硅微尖．通过实验，调整了腐蚀剂的组成，最后得到曲率半径１０～１５ｎｍ的硅微尖 The main research of wet chemical etching silicon micrometer. Silicon microprisms were prepared on monocrystalline silicon substrates with <111> and <100> planes by isotropic etching. The experimental results show that the <111> crystal plane silicon substrate is easy to prepare a silicon tip with a smaller tip radius of curvature. Through experiments, the composition of the etchant is adjusted, and finally a silicon micrometer with a radius of curvature of 10-15 nm