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“离子注入”是人们所熟悉的一项工艺技术。所谓“离子注入”就是将某种元素的离子在电场中加速,然后让高速离子打入某种材料的靶片。“离子注入”在半导体器件制作工艺中的应用极其成功和出色,它的优越性远远超出过去的“扩散”工艺。如果有意识地变更注入离子的能量和质量,使注入离子只作用到被轰击表面100A以内的深度。这时,注入离子不但不能打入靶片,反而将靶片材料的原子溅射出来,也就是说“离子注入”变成了“离子溅射”。可想而知,在“离子注入”工艺过程中,必须注意防止“离子溅射”的出现。然而,在机加工中,例如表面加工、成形和抛光,“离子溅射”却是一种极有力的工艺。
Ion implantation is a familiar technology. The so-called “ion implantation” is the acceleration of an element of ions in the electric field, and then let the high-speed ions into the target of a material film. “Ion implantation” has been extremely successful and outstanding in the fabrication of semiconductor devices, and its superiority goes far beyond past “diffusion” processes. If the energy and mass of implanted ions are intentionally varied, the implanted ions only act to a depth within the surface being bombarded 100A. At this moment, the implanted ions not only can not penetrate into the target film, but sputter the atoms of the target material, that is to say, “ion implantation” becomes “ion sputtering”. One can imagine that in the “ion implantation” process, we must pay attention to prevent the “ion sputtering” appears. However, “ion sputtering” is a very powerful process in machining, such as surface finishing, forming and polishing.