现在人们研究的非平衡等离子体大多是在低气压（1.33 Pa～1.33 kPa）、低质量流量条件下,由射频（13.5 MHz）、微波（2450 MHz）以及交、直流高电压激发的辉光放电产生的,作为一种直接向反应体系施加能量的方法,已在等离子体化学合成与分解、溅射制膜、气相淀积、聚合与引发聚合、材料表面改性、沉积刻蚀和低温灰化等方面应用,取得了引人瞩目的应用效果.Maezono等人[1]在压力为0.08 kPa,Ar作 Nowadays, most of the non-equilibrium plasmas studied are glow discharges excited by radio frequency (13.5 MHz), microwave (2450 MHz) and AC / DC high voltage under low pressure (1.33 Pa ~ 1.33 kPa) and low mass flow As a method of directly applying energy to the reaction system has been in plasma chemical synthesis and decomposition, sputtering film, vapor deposition, polymerization and initiation of polymerization, material surface modification, deposition and etching and low temperature ashing And other applications, and achieved remarkable results.Maezono et al [1] at a pressure of 0.08 kPa, Ar for