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据《Semiconductor International》1988年5月号报道,考虑到对远紫外曝光需要的迅速增长,西德Lambda Physik公司与美国Acton公司联合一起,研制成单级准分子激光微光刻系统,并且其原型机已在AT&T贝尔实验室进行考核,在多晶硅上刻出了特征尺寸为0.5μm的图形。 该系统采用的单级氟化氪准分子激光器,能稳定发射2W的窄带紫外光,其波长为218.4nm(可调范围0.4nm),带宽0.003nm,带宽稳定度优于0.001nm。这个系统是采用光纤数
According to “Semiconductor International” May 1988 report, taking into account the rapid growth of the need for deep UV exposure, West Germany Lambda Physik Corporation and the United States Acton jointly developed a single-stage excimer laser lithography system, and its prototype Machine has been in the AT & T Bell Labs assessment, in the polycrystalline silicon engraved feature size of 0.5μm graphics. The single-stage krypton fluoride excimer laser used in the system can stably emit 2W narrow-band ultraviolet light with a wavelength of 218.4nm (adjustable range of 0.4nm), a bandwidth of 0.003nm and a bandwidth stability of better than 0.001nm. This system uses the number of optical fibers