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二氧化硅反应离子刻蚀中氟的作用=Roleoffluorineinreactiveionetchingofsilicondioxide[刊.英]/Ikegaml.N.…JpnJApelPhys.-199s,32(12D).-6088~6094用热吸附和...
Role of fluorine in silica reactive ion etching = Roleoffluorineinreactiveionetchingofsilicondioxide [Issue. English] / Ikegaml. N. ... JpnJApelPhys. -199s, 32 (12D). -6088 ~ 6094 with thermal adsorption and ...