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衍射波前质量是刻划光栅的重要性能指标之一,对于机械刻划光栅,刻划机的刻线定位精度直接影响光栅的波前质量。建立了刻划机固有存在的刻线位置和转角误差与光栅衍射波前误差间的数学关系,分析了各误差对衍射波前质量的影响。针对该误差设计了一种基于双频激光干涉测量的刻划机刻线位置和转角误差测量的光路,并提出了一种主动控制技术,即采用单压触动器校正刻线位置和转角误差的方法。根据该校正方法设计了刻划机的双层光栅承载工作台结构,并进行了尺寸为80 mm×60 mm、刻线密度为194 line/mm的光栅刻划实验。实验结果表明,刻划光栅的衍射波前误差由0.23λ降低至0.093λ(λ=632.8 nm),并且原子力显微镜测试光栅刻槽质量符合理论设计要求。
The quality of the diffraction wavefront is one of the important performance indexes of the grating. For the mechanical grating, the engraving accuracy of the engraving machine directly affects the wavefront quality of the grating. The mathematical relationship between the engraved line position and angular error inherent in the scoring machine and the diffraction error of the diffraction grating was established and the influence of each error on the quality of the diffraction wavefront was analyzed. Aiming at the error, an optical path based on dual-frequency laser interferometry was proposed to measure the position and angular error of engraving machine, and an active control technique was proposed to correct the position and angle error method. According to the calibration method, a double-layer grating bearing structure of a scoring machine is designed and a grating grating experiment with a size of 80 mm × 60 mm and a line density of 194 line / mm is performed. The experimental results show that the diffraction wavefront error of the grating is reduced from 0.23λ to 0.093λ (λ = 632.8 nm), and the quality of the groove grating is in line with the theoretical design requirements.