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选取NaCl-KCl-NaF-Na2B4O7摩尔比为2∶2∶1∶0.04的熔盐通过脉冲电沉积的方法在硅钢表面进行渗硼,通过测定不同沉积温度和沉积时间下的渗硼层厚度,求出熔盐脉冲电沉积渗硼过程中硼的扩散激活能和扩散常数。计算并验证了利用求得的扩散激活能、扩散常数和公式可以准确计算某一温度下熔盐脉冲电沉积过程中硼在硅钢中的扩散系数。与常规渗硼相比,脉冲电沉积渗硼的扩散激活能在数值上与其属于同一数量级,但扩散常数有所提高,进而有效提高了脉冲电沉积渗硼的扩散系数。
The molten salt with NaCl-KCl-NaF-Na2B4O7 molar ratio of 2: 2: 1: 0.04 was selected to be boron infiltrated on the surface of silicon steel by pulse electrodeposition. The thickness of boronizing layer was measured by different deposition temperature and deposition time, The diffusion activation energy and diffusion constant of boron during molten salt pulse electrodeposition. The diffusivities of boron in silicon steel during pulse electrodeposition of molten salt at a certain temperature were calculated and verified by using the obtained diffusion activation energy, diffusion constant and formula. Compared with the conventional boronizing, the diffusion activation energy of pulsed electrodeposition boronization is numerically equivalent to that of boronizing, but the diffusion constant is increased, and the diffusion coefficient of pulsed electrodeposition boronizing is effectively increased.