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目前,存在于非晶硅材料中的一个重要问题是其稳定性,氢虽能起饱和悬键或使无规网络软化的作用而使隙态密度降低,但由于它对温度及光照等因素敏感而稳定性差.解决的途径之一是用卤族元素代替氢.a-Si∶F∶H就具有较好的热稳定性.SiCl_4是比SiF_4和SiH_4都便宜而广泛应用于半导体工业中的物质,采用SiCl_4作为原材料的a-Si∶Cl∶H的研究更具有实际意义.我们曾在早期的文章中发表了对a-Si∶Cl∶H的初步研究结果,本文报道我们对a-Si∶Cl∶H的光电导的研究结果.
At present, one of the important problems existing in amorphous silicon materials is its stability. Hydrogen, though capable of saturating dangling bonds or softening the random network, reduces the density of the interstitial space. However, due to its sensitivity to temperature and light And stability is poor.One way to solve is to replace the hydrogen with halogen elements.a-Si: F: H has better thermal stability.SiCl_4 is SiSi_4 and SiH_4 are cheap and widely used in the semiconductor industry, substances , The use of SiCl_4 as a raw material of a-Si: Cl: H research more practical.We have published in the early article of a-Si:Cl:H preliminary results, we report the a-Si: Results of photoconductivity of Cl: H.