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使用具有不同非平衡度的磁控管直流磁控溅射技术沉积CrN_x镀层,并用Langmuir探针诊断、高斯仪测量、Ansys软件模拟等手段进行表征,研究了磁场非平衡度对溅射等离子体的空间分布状态以及CrN_x镀层的微观结构、硬度及摩擦性能的影响。结果表明:低非平衡度磁控管(K为2.78)将多数离子束缚在靶材表面大约6 cm范围内,而对于高非平衡度磁控管(K为6.41)则在此区域没有类似的高密度等离子体存在。随着磁场非平衡度的增大,CrN_x镀层的厚度递增,物相结构也从Cr+Cr_2N依次向Cr+Cr_2N+CrN和Cr_2N+CrN转化,且镀层的平整度和致密性随之明显改善。同时,CrN_x镀层的硬度随着非平衡度的增大而提高,摩擦系数则随之减小。
CrN_x coatings were deposited by magnetron DC magnetron sputtering with different unbalance degrees. The Langmuir probe, Gauss meter and Ansys software were used to characterize the CrN_x coatings. The effect of magnetic field unbalance on sputtering plasma The spatial distribution and the microstructure, hardness and tribological properties of CrN_x coatings. The results show that the low unbalanced magnetron (K = 2.78) binds most of the ions to the target surface within about 6 cm, whereas for the high non-equilibrium magnetron (K = 6.41), there is no similar High-density plasma exists. With the increase of non-equilibrium magnetic field, the thickness of CrN_x coating increases and the phase structure changes from Cr + Cr_2N to Cr + Cr_2N + CrN and Cr_2N + CrN, and the flatness and compactness of the coating are obviously improved. At the same time, the hardness of CrN_x coating increases with the increase of non-equilibrium, and the friction coefficient decreases.