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采用常温直流磁控溅射法在201无镍不锈钢表面沉积了纯钛薄膜。XRD分析表明,薄膜是六方金属钛结构,并且膜相数量受沉积条件的影响。钛薄膜一般具有高度的择优取向,但其择优取向的晶面并不固定,也会出现多个晶面择优生长现象。个别工艺参数下,由于钛原子的渗入,基底发生较严重的晶格畸变。利用拉脱法评估了负偏压对钛膜与201基底附着强度的影响。
The pure titanium film was deposited on 201 nickel-free stainless steel by DC magnetron sputtering at room temperature. XRD analysis shows that the film is a hexagonal metal titanium structure, and the number of film phase is affected by the deposition conditions. Titanium thin films generally have a high degree of preferred orientation, but the preferred orientation of the crystal plane is not fixed, there will be multiple crystal face preferred growth phenomenon. Under certain process parameters, due to the infiltration of titanium atoms, the substrate more serious lattice distortion. The influence of negative bias on the adhesion of titanium film to substrate 201 was evaluated by pull-off method.