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e型电子枪作为光学镀膜的主要蒸发源,其能量系统的稳定性对光学镀膜起到很大作用,本文利用改变空间磁场的分布、改变电子枪的扫描模式和扫描频率和改变e型电子枪的功率三种方式,对e型电子枪能量系统的进行调整,为后续的光学镀膜生产提供了依据和建议。
As the main evaporation source of optical coating, the stability of energy system plays an important role in the optical coating. In this paper, we change the scanning mode and scanning frequency of the electron gun and change the power of the e-gun by changing the distribution of the magnetic field. Kinds of ways to adjust the e-gun energy system for the follow-up optical coating provides the basis for production and recommendations.