美帝贝尔实验室正在研制用于制作集成电路的实验性透明(Se—through)光掩模,据称它兼有通用光掩模所达不到的耐久性和精确度。同时,它比铬或乳胶掩模有更好的抗蚀性。这种新的金属—氧化物掩模既具有一般透明乳胶掩模的透明和易于对准的特性,又具有铬掩模的耐久性。同时,它解决了乳胶掩模的不耐用问题和铬掩模的不透明和针孔问题。贝 At MiBEL Labs, an experimental Se-through photomask for integrated circuits is being developed that is said to combine the durability and accuracy not achieved with conventional photomasks. At the same time, it has better corrosion resistance than chromium or latex masks. This new metal-oxide mask combines both the transparent and easily-aligned nature of a generally transparent latex mask with the durability of a chromium mask. At the same time, it addresses the problem of non-durability of latex masks and opaque and pinhole problems of chromium masks. shell