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光学涂层历来最严重的限制是光学薄膜疏松、多孔和有针状微结构。二氧化锆和二氧化硅多层膜系即是一例。膜层中的微孔和细缝使涂层从一开始即有很多问题,如折射率低且不均匀,吸水,对环境不稳定,粗糙和散射。过去几年,美国光学镀膜实验公司(OCLI)发展了一种混合蒸发工艺,消除了金属氧化物涂层材料中由于微结构产生的许多问题。该工艺称为等离子体电镀,它不同于最近发展的以离子为基础的其它工艺。前者蒸发的原子,在生长薄膜表面约有10eV 能量。其工作原理是,
The most serious limitation of optical coatings has been the loose, porous and acicular microstructures of optical films. An example is zirconium dioxide and silicon dioxide multilayer films. Micropores and slits in the film cause the coating to have many problems from the very beginning, such as low and uneven refractive index, water absorption, environmental instability, roughness and scattering. Over the past few years, OCLI has developed a hybrid evaporation process that eliminates many of the problems associated with microstructures in metal oxide coating materials. This process, known as plasma plating, is different from the more recent ion-based other processes. The former evaporation of atoms, the growth of the film surface of about 10eV energy. Its working principle is,