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美国马里兰大学(University of Maryland)的研究团队最近提出一种多光子光阻剂(multi-photon photoresists),能让可见光微影达到纳米等级的分辨率;通常微影分辨率是与曝光时间成反比。该团队新开发的多光子技术简称RAPID(Resolution Augmentation
A team of researchers at the University of Maryland in the United States recently proposed a multi-photon photoresistor that allows visible lithography to achieve nanoscale resolution; lithography resolution is usually inversely proportional to exposure time . The team newly developed multiphoton technology referred to as RAPID (Resolution Augmentation