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通过采用磁控溅射工艺,将两种铁基和镍基材质的靶材溅射到基材(1Cr18Ni9Ti)上,形成4种薄膜。对靶材、基材和薄膜等分别在不同浓度硫酸中的耐腐蚀性进行了测量,并对薄膜在0.05mol/L硫酸中的耐点蚀性进行了研究。通过对Tafel曲线、循环极化曲线及显微组织的分析,结果表明:溅射后薄膜组织为微晶,薄膜的耐蚀性普遍比溅射材前靶的耐蚀性要好;薄膜耐点蚀性很好。
By using a magnetron sputtering process, two iron-based and nickel-based targets were sputtered onto a substrate (1Cr18Ni9Ti) to form four films. The corrosion resistance of target, substrate and film in sulfuric acid with different concentrations respectively were measured. The pitting corrosion resistance of the film in 0.05 mol / L sulfuric acid was studied. The results of Tafel curves, cyclic polarization curves and microstructures show that the microstructure of the film is fine after sputtering, and the corrosion resistance of the film is generally better than that of the sputtering target. Good sex.