离子注入技术在六十年代后期受到重视,发展较为迅速,首先用于半导体器件的制造,迄今已成为制造集成电路元件的重要方法。所谓离子注入就是在高真空中将离子化的原子或分子加速到高能量以渗入固体表面,可显著改 Ion implantation technology was valued in the late 1960s and developed rapidly. First, the fabrication of semiconductor devices has so far become an important method for manufacturing integrated circuit components. The so-called ion implantation is in a high vacuum ionized atoms or molecules accelerated to high energy to penetrate the solid surface can be significantly changed