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电子束的穿透能力很弱(仅X射线的10~(-3)以下).对一般加速电压力50—100千伏的透射电子显微镜,只能透过1000埃以下的薄样品.制取这种厚度小于10~(-4)毫米的薄膜样品是一件十分困难的工作.目前广泛使用的制样技术为复型法.
The penetration of an electron beam is very weak (less than 10 -3 for X-rays only). For transmission electron microscopes with a general accelerating voltage of 50-100 kV, only thin samples up to 1000 A can be transmitted. This film thickness of less than 10 ~ (-4) mm film is a very difficult task. Currently widely used sample preparation technology for the complex method.