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按计划,2006年只推出ITRS修正版而非全新版本,因此其中的重大修改不可能太多。不过ITRS2006修正版的光刻篇则不然,几乎每一页都被改写,主要是因为出现了一个非常重要的更新,那就是将双重图形技术列为进一步提升193nm浸没式光刻(193i)分辨率的潜在解决方案。鉴于其在过去一年内的巨大影响力。双重图形出现在光刻篇的每个部分,包括艰难的挑战、技术要求和潜在解决方案等。
It is planned that only a revised version of ITRS will be released in 2006 instead of a completely new version, so one of the major changes is unlikely. However, ITRS2006 revised version of the lithography is not the case, almost every page has been rewritten, mainly because there has been a very important update, that is, as a dual graphics technology to further enhance the 193nm immersion lithography (193i) resolution Potential solution. Given its huge influence over the past year. Dual graphics appear in every part of the lithography, including difficult challenges, technical requirements and potential solutions.