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气体压力施压是实现纳米压印技术中将模板压入转移介质的重要技术路径,在克服应力不均匀、保护基片和模板等方面优势明显。报道了一种旨在提高压印压力均匀性、低压力施压的真空负压紫外固化纳米压印系统的研制。制备真空腔室,腔室顶部利用弹性橡胶环结合紫外透过性好的SiO2玻璃与腔体连接,采用抽真空的方式形成负压,腔室外大气压强通过SiO2玻璃均匀地作用到压印模板上,将其压入液态紫外敏感光刻胶中,再采用紫外光固化光刻胶,分离后实现模板图形向基板的转移。压印力大小取决于腔室内外的气体压强差,通过调节腔室内部气压大小改变施加在模板上的实际压力,内部气压大小通过连通气压表观察。图形转移实验结果表明,所研制纳米压印样机系统能够实现图形的高保真转移,在基片上形成光刻胶材质的结果图形,500nm特征线宽图形转移实验结果清晰,在较大面积基片上的压印压力均匀性良好。
Pressure gas pressure is to achieve nano-imprint technology will be pressed into the transfer medium template an important technical path in overcoming the uneven stress, protection of the substrate and the template has obvious advantages. A vacuum negative pressure UV curing nanoimprint system was developed to improve the uniformity of pressure and low pressure. Vacuum chamber is prepared, the top of the chamber is connected with the cavity through the elastic rubber ring and the well-permeable SiO2 glass, vacuum is used to form the negative pressure, and the atmospheric pressure outside the chamber is uniformly distributed on the imprint template through the SiO2 glass. , Press it into the liquid UV-sensitive photoresist, and then use UV-curable photoresist, after separation to achieve the transfer of the template to the substrate. The size of the imprinting force depends on the difference of gas pressure inside and outside the chamber. The actual pressure exerted on the template is changed by adjusting the pressure inside the chamber. The internal pressure is observed through the connected barometer. The results of the pattern transfer experiment show that the developed nano-imprint prototype system can realize the high fidelity transfer of the pattern, and the result pattern of the photoresist material is formed on the substrate. The result of the transfer experiment of the 500nm feature line width is clear, and on the larger area substrate Imprint pressure uniformity is good.