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利用增重法,研究了GH3535合金在700℃/700 h下的恒温氧化行为。采用扫描电镜(SEM)、X射线衍射(XRD)、电子探针(EPMA)和同步辐射荧光(SRXRF)分析技术研究了GH3535合金高温氧化膜的氧化动力学、形貌及氧化物的组成。结果表明,GH3535合金在700℃/700 h氧化后表面氧化膜无明显剥落,氧化动力学曲线遵循立方规律,氧化膜厚度为5μm左右,无内氧化现象发生。700℃下,GH3535合金属于完全抗氧化等级。合金表面生成的氧化膜成分以Ni O、Cr2O3、Ni Cr2O4和Ni Mn2O4为主。
The weight loss method was used to study the isothermal oxidation behavior of GH3535 alloy at 700 ℃ for 700 h. The oxidation kinetics, morphology and oxide composition of GH3535 alloy at high temperature were investigated by SEM, XRD, EPMA and SRXRF. The results showed that the surface oxide film of GH3535 alloy did not peel off obviously after being oxidized at 700 ℃ for 700 h, and the oxidation kinetics curve obeyed the cubic law. The thickness of the oxide film was about 5μm, and no internal oxidation occurred. At 700 ° C, the GH3535 alloy is fully antioxidant. The oxide film formed on the surface of the alloy is dominated by NiO, Cr2O3, NiCr2O4 and NiMn2O4.